Substrate Effects on the APCVD Growth of Titanium Nitride Films
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چکیده
منابع مشابه
Nanocharacterization of titanium nitride thin films obtained by reactive magnetron sputtering
Titanium nitride thin films are used in applications such as tribological layers for cutting tools, coating of some medical devices (scalpel blades, prosthesis, implants etc.), sensors, electrodes for bioelectronics, microelectronics, diffusion barrier, bio-microelectromechanical systems (Bio-MEMS) and so on. This work is a comparative study concerning the influence of substrate temperature on ...
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A fundamental study on the effect that pre-coating a substrate with metal spraying has on the properties of sputtered Titanium-nitride film (TiN film) was carried out. The residual stresses in TiN films sputtered on the substrates coated with various spray coatings were measured by X-ray stress measurement. It was observed that the residual stresses in TiN films sputtered on substrates coated b...
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